Synthesis and characterization of DC plasma-sputtered semiconductor oxide photoanodes to boost the photoelectro-Fenton removal of atrazine from sewage wastewater
Key Points
Enhanced photoelectro-Fenton process achieves greater atrazine removal.
Results show a 50% increase in efficiency with optimized semiconductor photoanodes.
Synthesis utilized direct current plasma-sputtering to develop novel photoanodes for wastewater treatment.
Supports further exploration of plasma technology in environmental applications.
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Synthesis and characterization of DC plasma-sputtered semiconductor oxide photoanodes to boost the photoelectro-Fenton removal of atrazine from sewage wastewater | Synapse