The investigation of electro-physical plasma parameters and composition under conditions of RF (13,56 MHz) inductive discharge was carried out. The model revising drawbacks of previous works in respect to heterogeneous loss of atomic species and gas temperature was suggested and verified. Mechanisms determining the influence of gas pressure and input power on steady-state densities of neutral and charged species were studied and explained. The model-based analysis of etching rate behaviors in cases of high and low volatile reaction products was performed.
Ruslan Giniyatullin (Wed,) studied this question.