Effect of ammonia borane thermal decomposition under different Ar fluxes on large-area boron nitride films for quantum photonic applications

Key Points

• To explore how varying argon flow during ammonia borane decomposition affects boron nitride film properties.
• Utilized atmospheric pressure chemical vapor deposition (AP-CVD) for film growth.
• Examined the thermal decomposition of ammonia borane under different argon (Ar) flow rates.
• Analyzed the resulting boron nitride films for fluorescence characteristics.
• Films exhibited fluorescence intermittency, pointing to defects in the material.
• Defects were identified as potential single photon emitters for quantum applications.