Impact of variations in ALD procedure on nanomorphology, protecting properties and chemical stability of thin TiO 2 films

Key Points

• This research aims to determine how different ALD deposition temperatures influence the characteristics of thin TiO2 films.
• Deposited thin TiO2 films using atomic layer deposition at 150 and 250 °C.
• Utilized FTO and Si/SiO2 as substrates for film growth.
• Analyzed morphology, chemical stability, and performance after deposition.
• Observed variation in nanomorphology based on the deposition temperature.
• Noted differences in chemical stability between films deposited at different temperatures.
• Found that the photoelectrochemical performance is affected by the deposition conditions.