Hf x Zr 1-x O 2 Thin Films from Chemical Vapor Deposition of Fluorinated β-Ketoenamine Precursors

Key Points

• This research aims to develop and characterize new molecular precursors for the deposition of hafnium-zirconium-oxide coatings.
• Synthesis of Zr(IV) and Hf(IV) complexes
• Application of complexes in chemical vapor deposition (CVD)
• Formation of hafnium-zirconium-oxide (HZO) coatings
• Successful synthesis of new Zr(IV) and Hf(IV) precursors
• Demonstration of effective CVD of mixed hafnium-zirconium-oxide thin films
• Enhanced properties of obtained coatings compared to traditional methods