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Regulatory mechanism of chelating agents on the chemical mechanical polishing performance of soft magnetic alloys and DFT theoretical study | Synapse
March 3, 2026
Regulatory mechanism of chelating agents on the chemical mechanical polishing performance of soft magnetic alloys and DFT theoretical study
TX
Tianyao Xie
ZZ
Zhenghao Zhou
XY
Xing Yuan
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Key Points
Chelating agents improve chemical mechanical polishing performance in soft magnetic alloys.
Results indicate a significant enhancement in polishing efficiency, with performance metrics notably increased.
Density functional theory was used to investigate the interactions between chelating agents and alloys.
Findings highlight the need for further exploration of regulatory mechanisms in polishing processes.
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Xie et al. (Tue,) studied this question.
synapsesocial.com/papers/69a75b32c6e9836116a2218b
https://doi.org/https://doi.org/10.1016/j.apsusc.2026.165992