Synthesis, Characterization, and Electron-Beam Lithography of Tetakis(Triphenylstannyl) Orthosilicate and Tetrakis(Triacetoxystannyl) Orthosilicate for the Development of Inorganic Molecular EUV Resists | Synapse
Synthesis, Characterization, and Electron-Beam Lithography of Tetakis(Triphenylstannyl) Orthosilicate and Tetrakis(Triacetoxystannyl) Orthosilicate for the Development of Inorganic Molecular EUV Resists
This research focuses on developing and evaluating inorganic molecular photoresists for EUV lithography.
Synthesis of tetakis(triphenylstannyl) orthosilicate and tetrakis(triacetoxystannyl) orthosilicate.
Characterization of the synthesized materials.
Evaluation of their performance in electron-beam lithography.
Tetrakis(triacetoxystannyl) orthosilicate shows potential as a promising inorganic molecular photoresist for EUV lithography.
Abstract
, respectively. These results indicate that tetrakis(triacetoxystannyl) orthosilicate is a promising inorganic molecular photoresist candidate for EUV lithography.