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Unraveling the spontaneous advancement of precursor films from a liquid reservoir to an isolated wall | Synapse
March 3, 2026
Unraveling the spontaneous advancement of precursor films from a liquid reservoir to an isolated wall
YW
Yung-Ching Wang
YC
Yi-Min Chen
HT
Heng‐Kwong Tsao
National Central University
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Key Points
The advancement of precursor films occurs spontaneously, indicating a unique dynamic in film formation.
Key evidence shows that the transition from liquid reservoir to wall involves various spontaneous processes.
Observational analysis of film dynamics reveals significant insights into the behavior of precursor films at interfaces.
Understanding this advancement may enable the development of better materials in various industrial applications.
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Cite This Study
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Wang et al. (Thu,) studied this question.
synapsesocial.com/papers/69a75d6cc6e9836116a27770
https://doi.org/https://doi.org/10.1016/j.jcis.2026.140007