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May 6, 2026Applied Physics Letters

Advanced null ellipsometry for ultrathin film thickness measurement

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Authors

HDHaotian DongCYChengyuan YaoZWZizheng Wang

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Overview

Null ellipsometry demonstrates improved thickness metrology in ultrathin films, highlighting implications for optoelectronic technologies.

Key Points

  • The study aims to enhance the accuracy of thickness metrology for ultrathin films using null ellipsometry.
  • Develops an error analysis for null ellipsometry-based film metrology
  • Accounts for detector noise and azimuthal rotation errors
  • Identifies optimal wavelength-incident-angle combinations for measurement
  • Conducts measurements on ultrathin SiO2 films
  • Achieves picometer-level measurement repeatability of 0.98 pm
  • Exhibits significant improvement over commercial ellipsometers
  • Confirms accuracy of null ellipsometry without stringent environmental controls

Cite This Study

Dong et al. (2026) studied this question.

synapsesocial.com/papers/69faa28f04f884e66b5331c0https://doi.org/10.1063/5.0319919
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