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March 3, 2026Materials Science in Semiconductor Processing

Damage-threshold performance of Al2O3 films under high-repetition-rate 266 nm ultraviolet picosecond-laser irradiation

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Authors

MWMenglei WangKWKun WangWCWei Cao

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Overview

Observational analysis reveals damage-threshold performance in alumina films, suggesting potential applications in laser technology.

Key Points

  • Damage-threshold performance is crucial for alumina films when subjected to ultraviolet irradiation.
  • The study indicates that at high-repetition rates, specific alumina films exhibit varying damage thresholds.
  • Assessment using ultraviolet picosecond-laser strongly highlights the resilience of the films under testing conditions.
  • Implications suggest further exploration of alumina films in laser applications may enable improved technology options.

Cite This Study

Wang et al. (2026) studied this question.

synapsesocial.com/papers/69a767dbbadf0bb9e87e2a5fhttps://doi.org/10.1016/j.mssp.2026.110480
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