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Moxtek has attained the required feature fidelity for visible wavelength metalenses through e-beam lithography based mastering for a Nanoimprint Lithography (NIL) and Nb2O5 etching based manufacturing process. An overcoat is also added to the metalenses, which boosts performance and protects against handling damage. Metalens and associated test structure metrology results including MTF, veiling glare, and efficiency will be presented for various designs spanning the visible wavelength range with NA's varying from 0.02 to 0.71. Collectively, Moxtek has demonstrated volume manufacturing of metalenses for the visible regime, which was made possible by high precision NIL and Etch processes.
George et al. (2024) studied this question.