PulseExploreJournal ClubDebatesTrendingResearchersJournals
Instagram
HomeExploreJournal ClubTrending
Synapse
⌘+K
Synapse
February 9, 2026Journal of Materials Science Materials in Engineering0 citationsOpen Access

Electroless Ni-P deposition on flexible polyimide substrates with tin-palladium nucleation

MHMarcelo Kioshi HirataAMAndreia de MoraisAFAlexander Flacker

Key Points

  • This research aims to optimize the electroless deposition process of Ni-P thin films on flexible polyimide substrates.
  • Surface functionalization of polyimide using NaOH.
  • Nucleation utilizing tin and palladium.
  • Characterization with X-ray diffraction and scanning electron microscopy.
  • Contact angle measurements for surface analysis.
  • Pretreatment allows for a quicker electroless deposition process.
  • Ni-P films exhibit compact and spherical shapes with minimal defects.
  • Particle sizes range from 380 to 780 nm.

Abstract

Abstract The purpose of this study is to report a low-cost electroless deposition (EN) process of Ni-P thin films using a wet-chemical process on flexible polyimide substrate (Kapton ® 300HN DuPont™), comprising surface functionalization with NaOH, nucleation with Sn and Pd, and acceleration with HCl. The pretreatment performed on the polyimide surface was investigated using a contact angle system and Fourier-transform infrared spectroscopy (FTIR). Structural, morphological and electrical characterization of the Ni-P film were performed by X-ray diffraction (XRD), stylus scan profiler, scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), and four-point probe measurements. The results showed that the pretreatment of the flexible polyimide enables a faster EN process, with lower thermal expenses, delivering a compact, spherical shaped Ni-P film -free of holes, scratches, and flaws, with particle size ranging from 380 to 780 nm. Graphical abstract

Ask AI
Helpful
Bookmark
Share
View Full Paper

Cite This Study

Hirata et al. (2026) studied this question.

synapsesocial.com/papers/69897a86f0ec2af6756e8ad2https://doi.org/10.1186/s40712-025-00376-8
Ask AI
Helpful
Bookmark
Share
View Full Paper