Aqueous HF-HBrO 4 Solutions for Wet-Chemical Etching of (100) Silicon Wafer Surfaces

Key Points

• The research aims to evaluate the effectiveness of HF and HBrO4 mixtures for wet-chemical etching on silicon surfaces.
• Conducted experiments with aqueous solutions of HF and HBrO4.
• Measured etching efficiency on (100) silicon wafer surfaces.
• Analyzed results to determine the effectiveness of the mixtures.
• Achieved effective etching of silicon wafer surfaces without nitrogen oxide emissions.
• Demonstrated that HF-HBrO4 mixtures provide a polishing effect on silicon.