The feasibility of using a planar dielectric barrier discharge for film deposition on the surface of polyurethane substrates has been shown. The following conditions have been used: an atmospheric-pressure discharge generated in a flow chamber in a hexamethyldisilazane atmosphere at a fixed flow rate; carrier gas, helium; discharge frequency, 50 Hz; discharge current, 3 mA; apparent power transferred to the discharge, 24 VA; and deposition time, 30–1200 s. The surface morphology and elemental composition of the deposited film have been studied by scanning electron microscopy and energy-dispersive X-ray spectroscopy. Surface wettability has been determined by the contact angle method involving droplet imaging. Analysis of the elemental composition of the deposited coatings has shown the formation of an organosilicon film. The use of the contact angle method employing polar (distilled water) and nonpolar liquids (diiodomethane, glycerol) has shown that the wettability of the deposited coatings is higher than that of the untreated substrate.
Ivanov et al. (2026) studied this question.