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March 6, 2026The Journal of Physical Chemistry C0 citationsOpen Access

Vacancy-Driven Electronic Effects in Few-Layer HfS 2 Probed by Scanning Tunneling Microscopy and Spectroscopy

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GRGuilherme Rodrigues-FonteneleGFGabriel FonteneleLPLucas Polesi

Key Points

  • The research aims to explore the electronic effects caused by vacancies in hafnium disulfide (HfS2) across different layers.
  • Utilized scanning tunneling microscopy/spectroscopy for observation
  • Conducted density functional theory simulations
  • Examined both bulk and few-layer HfS2
  • Analyzed variations in the Fermi level and band gap
  • Observed Fermi level shifts due to sulfur vacancies
  • Identified p-type behavior in stoichiometric regions and n-type behavior in defective areas
  • Noted a decrease in band gap from 1.28 eV to 1.19 eV near sulfur vacancies
  • Reported thickness-dependent band gap changes ranging from 1.48 eV to 1.28 eV

Abstract

Vacancy-driven electronic effects in bulk and few-layer hafnium disulfide (HfS2) were investigated using scanning tunneling microscopy/spectroscopy and density functional theory simulations. Fermi level variations associated with sulfur vacancies were observed in spectroscopic data carried out on both bulk and nanoflakes of HfS2. Atomically resolved imaging revealed structural sulfur vacancies, which locally induce a pronounced shift in the Fermi level. Stoichiometric regions exhibit p-type semiconducting behavior, whereas defective regions display clear n-type doping. A noticeable reduction in the average band gap was also observed near sulfur vacancies, decreasing from 1.28 to 1.19 eV in bulk material. Finally, a thickness-dependent evolution of the electronic band gap was observed, ranging from 1.48 eV for the 3-layer to 1.28 eV for bulk HfS2.

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Cite This Study

Rodrigues-Fontenele et al. (2026) studied this question.

synapsesocial.com/papers/69aa6f3c531e4c4a9ff5943ehttps://doi.org/10.1021/acs.jpcc.5c08105
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