Fused-adamantane chalcogenidometalate clusters—the largest charge-neutral supertetrahedral clusters reported to date—are constructed via synergistic polyamine–organotin assembly. Exhibiting unprecedented C2v symmetry, excellent solubility, and uniform thin-film formability, these clusters serve as high-performance E-beam resists enabling high-resolution nanopatterning. In the Research Article (e23993), Jian Zhang, Qipu Lin, and co-workers highlight the pivotal role of charge-neutral cluster engineering in advancing nanolithography.
Luo et al. (Fri,) studied this question.
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