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March 14, 2026Journal of Materials Chemistry A0 citationsOpen Access

Atomic/molecular layer deposition of p-type conducting copper-sulfur-organic coordination polymer thin films for thermoelectric applications

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MHMari HeikkinenMFMalar Auxilia FrancisKMKristoffer Meinander

Key Points

  • To develop a three-precursor method for fabricating copper-based coordination polymer thin films.
  • Utilized atomic/molecular layer deposition for film creation
  • Focused on p-type conducting materials
  • Employed a three-precursor system for synthesis
  • Successfully fabricated thin films using the ALD process
  • Demonstrated potential for thermoelectric applications

Abstract

Here we report a three-precursor atomic/molecular layer deposition (ALD/MLD) process for the fabrication of copper-based coordination polymer thin films for thermoelectric applications. This process mimics the wet chemical synthesis of...

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Cite This Study

Heikkinen et al. (2026) studied this question.

synapsesocial.com/papers/69b4ba1818185d8a39802944https://doi.org/10.1039/d6ta01174h
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