Generated Pattern Current for Electroplating: Diffusion Layer Management for Fine-Grain Deposition and Dendrite Suppression

Key Points

• The aim is to improve grain structure and surface quality in electroplating through controlled nucleation.
• Utilized generated pattern current (GPC) for electroplating
• Implemented controlled high-nucleation bursts
• Allowed for recovery intervals in the diffusion layer
• Achieved better grain structure in deposited materials
• Enhanced surface quality was observed
• Reduced dendrite formation compared to traditional methods

Abstract