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May 12, 2026Vacuum and Surface ScienceOpen Access

Fundamentals of Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) and Safety Management of Chemical Substances Part 2 : Fundamentals of Chemical Reaction Kinetics

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Authors

ASAtsushi SEKIGUCHI

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Overview

Explains chemical reaction basics for CVD and ALD processes, highlighting their significance in technology.

Key Points

  • This work aims to outline fundamental concepts of chemical reactions essential for CVD and ALD applications.
  • Discussed the principles of chemical reactions related to CVD and ALD processes.
  • Outlined basic concepts in reaction kinetics for practical applications.
  • Established the foundational knowledge required for understanding CVD and ALD processes.
  • Identified key reaction analysis techniques relevant to these deposition methods.

Cite This Study

Atsushi SEKIGUCHI (2026) studied this question.

synapsesocial.com/papers/6a02c2fdce8c8c81e964057ahttps://doi.org/10.1380/vss.69.275
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