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May 17, 2026Bulletin of the Russian Academy of Sciences Physics0 citations

Resonant RF and Microwave Discharge in Argon for Plasma Treatment of Chitosan Films

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VAV. V. AndreevAAA. V. ArtemyevIBI. A. Barykov

Key Points

  • This research aims to explore how low-temperature argon plasma affects chitosan-based organic films.
  • Used two independent sources for generating argon plasma: radio-frequency and microwave discharges.
  • Investigated the transportation of plasma flows to the sample interaction region.
  • Conducted experiments to assess the effects of plasma treatment on chitosan films.
  • Specific results on the impact of plasma on the films were presented but not quantified in the abstract.

Abstract

Experiments were performed to study the effect of low-temperature argon plasma on chitosan-based organic films. The plasma is created independently by two sources based on radio-frequency and microwave discharges. The generation of plasma flows and their transportation to the region of interaction with the samples are considered, and the results of experiments on the effect on the films are presented.

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Cite This Study

Andreev et al. (2026) studied this question.

synapsesocial.com/papers/6a095ac47880e6d24efe0a77https://doi.org/10.1134/s1062873826700085
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