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Vanadium oxide nanostructures have emerged as a promising material system for a wide range of applications based on their structural, electronic, optical, and catalytic properties. The multiple phases of vanadium oxides, e.g., V2O3, VO2, and V2O5, feature distinct crystal structures and properties which contribute to their versatility. There are several methods to fabricate vanadium oxide nanostructures such as sol-gel synthesis, hydrothermal methods, physical vapor deposition, sputter deposition, chemical vapor deposition, atomic layer deposition (ALD), and solid-state reactions. From those techniques, ALD offers precise control over the conformality, thickness, and composition of thin films leading to unique possibilities for the functionalization of previously prepared nanostructured templates with vanadium oxides. This review summarizes recent advancements in the synthesis of ALD-based vanadium oxide nanostructures focusing on suitable ALD precursors, ALD process conditions, and required post-deposition thermal annealing treatments to transform the as-deposited vanadium oxide films to distinguished crystalline phases. The functional properties of ALD-based vanadium oxide nanostructures in catalysis, electrochemical energy storage, sensors, and stimuli-responsive “smart” devices are presented. Moreover, existing challenges in fabrication and practical application are discussed. Finally, future perspectives on tailoring the properties of ALD-based vanadium oxide nanostructures by adjusting templates, optimizing the vanadium oxide film thickness, or utilizing supercycle ALD processes are outlined, which can pave the way for sustainable applications and “smart” devices.
Hedrich et al. (Tue,) studied this question.