A high pressure of saturated zinc vapor (10–100 Pa) was achieved by anodic evaporation of zinc in an arc with a self-heated cathode at low discharge currents of 2–4 A and an argon pressure of 1 Pa. The deposition rate of Zn films from the expanding vapor flow reached 2 μm/min at a distance of 100 mm from the crucible. To determine the composition of the plasma flow, neutral and charged particles of the flow were separated using a grid probe with a retarding field and an electrical measurement of the ion current on a flat probe was performed. From a comparison of the results of gravimetric and electrical measurements, it follows that the deposited zinc films are formed mainly by a flow of positively charged clustered zinc ions, the average number of atoms in which increases with increasing discharge current up to ~10. The surface morphology and structure of the obtained films were studied by atomic force microscopy and X-ray diffraction.
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D. R. Emlin
N. V. Gavrilov
Journal of Surface Investigation X-ray Synchrotron and Neutron Techniques
Institute of Electrophysics
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Emlin et al. (Mon,) studied this question.
www.synapsesocial.com/papers/69d0aff2659487ece0fa613a — DOI: https://doi.org/10.1134/s1027451025702325