Performance Enhancement of TiO2-Based Capacitors via Plasma-Enhanced Atomic Layer Deposition and Plasma Pre-Treatment

Puntos clave

• The aim is to enhance the performance of TiO2-based capacitors using advanced plasma techniques.
• Utilized plasma-enhanced atomic layer deposition for TiO2 coating.
• Applied plasma pre-treatment to improve substrate properties.
• Assessed capacitance performance of DRAM-capacitor configurations.
• Achieved significant capacitance improvements in TiO2 capacitors.
• Demonstrated better electrical performance compared to traditional methods.
• Indicated potential for application in dynamic random access memory systems.

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