Atomic layer deposition (ALD) is an essential technique for depositing thin films with uniform thickness on 3D nanostructures, and it is actively being investigated for applications in metal interconnects. In...
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Kwangyong An
Kieran G. Lawford
Bonwook Gu
Journal of Materials Chemistry C
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An et al. (Thu,) studied this question.
www.synapsesocial.com/papers/69df2c62e4eeef8a2a6b1833 — DOI: https://doi.org/10.1039/d6tc00454g